Description
This work presents the fabrication and characterization of carbon microstructures from SU-8 photoresist by rapid thermal pyrolysis. The aim was to optimize lithography
and pyrolysis parameters to obtain conductive microstructures for sensor use. Structures were prepared on Si/SiO₂ and Al₂O₃ substrates and pyrolyzed up to 1200 °C
in nitrogen. The effect of temperature and dwell time on electrical properties was studied, showing that higher temperatures and longer dwell times lower electrical
resistance. The results confirm rapid thermal pyrolysis as an efficient, low-cost method for producing carbon microelectrodes for sensor applications.
| Pracovisko fakulty (katedra)/ Department of Faculty | CENAM |
|---|---|
| Tlač postru/ Print poster | Nebudem požadovať tlač posteru / I don't require to print the poster |
Authors
Pavol Durina
(Comenius University in Bratislava. FMPI)
Tomáš Roch
(Comenius University in Bratislava, FMPI, CENAM)
Tomáš Plecenik
(Centre for Nanotechnology and Advanced Materials, Faculty of Mathematics, Physics and Informatics, Comenius University Bratislava)
Adriana Kecerová
Dr
Jaroslava Škrinirová
